| 摘要 |
PROBLEM TO BE SOLVED: To provide a foreign substance detection method applied to a reflection type detection object prepared by forming a photoresist coating film on a semiconductor substrate such as a silicon substrate, by which a foreign substance embedded in the photoresist coating film can be detected with high reliability.SOLUTION: The foreign substance detection method for detecting a foreign substance included in a photoresist coating film includes: a step of reducing the thickness of a photoresist coating film 102 formed on a semiconductor substrate 101 through exposing and developing processes on the photoresist coating film 102; and a step of subjecting a thin resist film 112 obtained by the thickness reducing process of the photoresist coating film 102 to a foreign substance detecting process. In the foreign substance detecting process, a foreign substance 102c included in the photoresist coating film 102 is detected based on reflected light Lr generated by irradiating the surface of the thin resist film 112 with inspection light Lc. |
