发明名称 SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME
摘要 A semiconductor device includes a first element structure that includes a charge supply layer of first polarity; a charge channel layer of second polarity, the charge channel layer being formed above the charge supply layer and including a recess portion; and a first electrode formed in the recess portion above the charge channel layer.
申请公布号 KR101357526(B1) 申请公布日期 2014.02.03
申请号 KR20120104744 申请日期 2012.09.20
申请人 发明人
分类号 H01L21/335;H01L29/778 主分类号 H01L21/335
代理机构 代理人
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