发明名称 MANUFACTURING METHOD OF IMAGE SENSOR, MANUFACTURING METHOD OF α-RAY PROTECTION GLASS, AND IMAGE SENSOR
摘要 PROBLEM TO BE SOLVED: To solve such a problem that when coating a glass substrate directly with an α-ray blocking material, the glass substrate is warped by the stress of the α-ray blocking material.SOLUTION: The manufacturing method of an image sensor includes a film formation step for forming an α-ray blocking film on a silicon substrate, a bonding step for bonding the silicon substrate and a glass substrate by bringing the α-ray blocking film into contact with the glass substrate, a removal step for removing the silicon substrate, and a fixing step for fixing the glass substrate to an imaging chip, including an image capturing region where a plurality of pixels are arranged, so that the α-ray blocking film faces the image capturing region.
申请公布号 JP2014022573(A) 申请公布日期 2014.02.03
申请号 JP20120160010 申请日期 2012.07.18
申请人 NIKON CORP 发明人 KAMEKAWA TAKAYUKI
分类号 H01L27/14;H01L23/02;H01L25/065;H01L25/07;H01L25/18 主分类号 H01L27/14
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