发明名称 CHEMISTRY COMPATIBLE COATING MATERIAL FOR ADVANCED DEVICE ON-WAFER PARTICLE PERFORMANCE
摘要 To manufacture a coating for an article for a semiconductor processing chamber, the article including a body of at least one of Al, Al2O3, or SiC, and a ceramic coating on the body. The ceramic coating includes a compound comprising Y2O3 in a range from about 50 mol % to about 75 mol %, ZrO2 in a range from about 10 mol % to about 30 mol %, and Al2O3 in a range from about 10 mol % to about 30 mol %, wherein the number of nodules per inch is in a range from about 30 nodules to about 45 nodules and the porosity is in a range from about 2.5% to about 3.2%.
申请公布号 US2014030486(A1) 申请公布日期 2014.01.30
申请号 US201313830608 申请日期 2013.03.14
申请人 APPLIED MATERIALS, INC. 发明人 SUN JENNIFER Y.;KANUNGO BIRAJA PRASAD;LUBOMIRSKY DMITRY
分类号 H01L21/02 主分类号 H01L21/02
代理机构 代理人
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