| 摘要 |
A continuous sterilization system is provided which reliably supports a sterilization target so that the sterilization target is not tipped over during a sterilization process and can stably ensure uniform irradiation periods on any portion of inner and outer surfaces and moreover, a portion sterilized by electron beam irradiation is not contaminated again. The continuous sterilization system is provided with a first conveying means, a first electron beam accelerator, a second conveying means, a second electron beam accelerator, and a third electron beam accelerator. |
