MAGNETRON SPUTTERING DEVICE EQUIPPED WITH MAGNETRON COOLING PORTION
摘要
<p>The present invention relates to a magnetron sputtering device equipped with a magnetron cooling portion, which cools a magnetron by using a cooling gas. The present invention provides the magnetron sputtering device equipped with the magnetron cooling portion, comprising: a process chamber inside of which a substrate support is provided; the magnetron, which is provided on one side of the process chamber and comprises a first magnet portion and a second magnet portion which face each other; a power supply portion for supplying power to targets which are coupled to the first magnet portion and second the second magnet portion; and the magnetron cooling portion for supplying the cooling gas to the first magnet portion and the second magnet portion.</p>
