A CHEMICAL MECHANICAL POLISHING (CMP) COMPOSITION COMPRISING TWO TYPES OF CORROSION INHIBITORS

摘要

A chemical-mechanical polishing ("CMP") composition (P) comprising
(A) inorganic particles, organic particles, or a mixture or composite thereof,
(B) at least one type of N-heterocyclic compound as corrosion inhibitor,
(C) at least one type of a further corrosion inhibitor selected from the group consisting of:
(C1) an acetylene alcohol, and
(C2) a salt or an adduct of
(C2a) an amine, and
(C2b) a carboxylic acid comprising an amide moiety,
(D) at least one type of an oxidizing agent,
(E) at least one type of a complexing agent, and
(F) an aqueous medium.