| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a minute pattern measuring method which precisely measures trails of the bottom part of a minute structure pattern by using a CD-SEM; and to provide a minute pattern measuring device. <P>SOLUTION: In the minute pattern measuring method, an image of a minute pattern of a photomask is obtained, and the image is processed to generate a signal profile, and the signal profile is processed to generate a differential profile. Then, a differential peak value of the minute pattern is computed from the differential profile to compute the trailing of the bottom part of the minute pattern. <P>COPYRIGHT: (C)2011,JPO&INPIT</p> |
