| 发明名称 |
POSITIVE PHOTORESIST COMPOSITION |
| 摘要 |
<p>The present invention relates to a positive photoresist composition and, more specifically, to a positive photoresist composition which increases process yield by including a compound represented by chemical formula 1 as a solvent and improving adhesion between a photoresist and a substrate for a light emitting diode when the photoresist is formed on the substrate.</p> |
| 申请公布号 |
KR20140011037(A) |
申请公布日期 |
2014.01.28 |
| 申请号 |
KR20120077539 |
申请日期 |
2012.07.17 |
| 申请人 |
DONGWOO FINE-CHEM CO., LTD. |
发明人 |
OH, YONG NAM;KIM, SEUNG ON;LEE, KYONG HO |
| 分类号 |
G03F7/039;G03F7/004;G03F7/022 |
主分类号 |
G03F7/039 |
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