发明名称 SELF-POLYMERIC PHOTOPOLYMERIZABLE METHACRYLATE MONOMER, METHACRYLATE POLYMER AND PHOTOSENSITIVE RESIN COMPOSITION INCLUDING THE SAME
摘要 An autopolymerization type photopolymerizable methacrylic monomer is provided to inhibit production of volatile or sublimable product from the hardening material, thereby preventing the contamination of exposer or oven. The autopolymerization type photopolymerizable methacrylic monomer is manufactured by reacting 50-60 wt.% of the photoinitiator including the acid group with 40-50 wt.% of 2- isopropenyl -2- oxazoline under catalyst. The mathacryl polymer is prepared by polymerization of the autopolymerization type photopolymerizable methacrylic monomer.
申请公布号 KR101356888(B1) 申请公布日期 2014.01.28
申请号 KR20070058791 申请日期 2007.06.15
申请人 发明人
分类号 C07D251/24 主分类号 C07D251/24
代理机构 代理人
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