发明名称 INSTRUMENT FOR MEASURING ABERRATIONS OF WAVEFRONT
摘要 The invention relates to the medical instrumentation technology, namely to the ophthalmological instruments used for eye examination and measurement of the aberrations of the optical system of eye aimed at vision correction, especially those instruments providing for high precision of the measurements. The instrument for measuring the aberrations of the wavefront is based on ray tracing principle with adjustment for the slope of laser beam used for probing the eye in a mode allowing for crossing the vision axis in the plane of the retina. The instrument contains the canal for positioning and accommodation, probing canal, receiving canal, canal for control and processing and optical coupling system consisting of the first electrically guided fluid lens and the second electrically guided fluid lens mounted between the eye and the probing canal at the fixed distance. Each electrically guided fluid lens is connected electrically with canal for control and processing for calculating the adjustment for the strength of lens that allows for positioning lens in a way adjusting the slope of laser beam used for probing the eye providing for the direction of the laser beam crossing the vision axis in the plane of the retina.
申请公布号 UA104398(C2) 申请公布日期 2014.01.27
申请号 UA20130005417 申请日期 2013.04.26
申请人 MOLEBNYI VASYL VASYLIOVYCH 发明人 MOLEBNYI VASYL VASYLIOVYCH;SOKURENKO VIACHESLAV MYKHAILOVYCH
分类号 A61B3/103;A61B3/10 主分类号 A61B3/103
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