| 摘要 |
A method for fabricating a variable resistance memory device includes forming an insulating layer having a trench extending in a first direction over a substrate, forming first electrode conductive layers on both sidewalls of the trench, forming island-shaped first electrodes by patterning the conductive layers in a second direction crossing the first direction, forming variable resistance patterns over the first electrodes, and forming second electrodes over the variable resistance patterns. |
