发明名称 RESIN COMPOSITION FOR FORMING PATTERN AND PATTERN FORMING PROCESS
摘要 PROBLEM TO BE SOLVED: To provide a resin composition for forming pattern capable of forming a sea-island structure consisting of one island part having a cylindrical phase separation structure and a sea part surrounding the island part in a hole.SOLUTION: A resin composition for forming pattern for hole shrinking contains a block copolymer I comprising an aromatic ring containing polymer a and a (meth)acrylate polymer b and a (meth)acrylate polymer II consisting of repeating units of the (meth)acrylate polymer b. When the mass of the block copolymer I is defined as Wand the mass of the (meth)acrylate polymer II is defined as W, W/W≥1, when the mass of the aromatic ring containing polymer is defined as Wand the mass of the (meth)acrylate polymer b is defined as W, 1≤W/W≤9, the number average molecular weight of the (meth)acrylate polymer b is defined as Mand the number average molecular weight of the (meth)acrylate polymer (II) is defined as M, 0.01≤M/M≤2.
申请公布号 JP2014012807(A) 申请公布日期 2014.01.23
申请号 JP20120208062 申请日期 2012.09.21
申请人 ASAHI KASEI E-MATERIALS CORP 发明人 SHIRAE YOSHIAKI;IWAMA TATSUHIRO
分类号 C08L53/00;B05D7/24;B82Y30/00;B82Y40/00;C08F297/00 主分类号 C08L53/00
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