| 摘要 |
1531648 'Etching PHILIPS' GLOEILAMPENFABRIEKEN NV 31 Aug 1977 [3 Sept 1976] 36334/77 Heading B6J [Also in Division C7] A gold layer on a substrate is selectively chemically etched through a (photo) resist pattern, a potential (whose value depends on the etching bath) being applied -between the gold and an electrode in the bath such that the etch rate is at most equal to the rate in the absence of the potential. The substrate may be e.g. GaAsP, GaP or Ti. The process is stated to reduce unequal etching areas and undercutting round the resist and is applicable even when the final pattern forms discrete areas. |
