发明名称 WIRING SUBSTRATE, METHOD FOR MANUFACTURING THE WIRING SUBSTRATE, AND SEMICONDUCTOR PACKAGE
摘要 A wiring substrate includes an insulating layer including a reinforcement member and having a first surface and a second surface positioned on an opposite side of the first surface, an electrode pad exposed from the first surface, a layered body including first insulating layers and being formed on the second surface, the first insulating layers having a first insulating material as a main component, another layered body including second insulating layers and being formed on the layered body, the second insulating layers having a second insulating material as a main component, and another electrode pad exposed from a surface of the another layered body that is opposite to the layered body. The number of the first insulating layers is equal to that of the second insulating layers. The first insulating layers have a thermal expansion coefficient that is greater than that of the second insulating layers.
申请公布号 US2014021625(A1) 申请公布日期 2014.01.23
申请号 US201313936443 申请日期 2013.07.08
申请人 SHINKO ELECTRIC INDUSTRIES CO., LTD. 发明人 NAKAMURA JUNICHI;OGAWA MICHIRO;KOBAYASHI KAZUHIRO;DENDA HIROMI
分类号 H05K1/02;H01L23/48 主分类号 H05K1/02
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