| 发明名称 |
HIGH PURITY ALUMINUM COATING HARD ANODIZATION |
| 摘要 |
<p>The disclosure relates to a chamber component or a method for fabricating a chamber component for use in a plasma processing chamber apparatus. The chamber component includes a polished high purity aluminum coating and a hard anodized coating that is resistive to the plasma processing environment.</p> |
| 申请公布号 |
KR20140009178(A) |
申请公布日期 |
2014.01.22 |
| 申请号 |
KR20137012019 |
申请日期 |
2011.09.30 |
| 申请人 |
APPLIED MATERIALS, INC. |
发明人 |
OUYE ALAN HIROSHI;KOCH RENEE MARGUERITE |
| 分类号 |
H01L21/205;H01L21/3065;H05H1/46 |
主分类号 |
H01L21/205 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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