发明名称 Methods and structures for rapid switching between different process gases in an inductively-coupled plasma (ICP) ion source
摘要 An openable gas passage provides for rapid pumpout of process or bake out gases in an inductively coupled plasma source in a charged particle beam system. A valve, typically positioned in the source electrode or part of the gas inlet, increases the gas conductance when opened to pump out the plasma chamber and closes during operation of the plasma source.
申请公布号 US8633452(B2) 申请公布日期 2014.01.21
申请号 US201113182187 申请日期 2011.07.13
申请人 GRAUPERA ANTHONY;KELLOGG SEAN;UTLAUT MARK W.;PARKER N. WILLIAM;FEI COMPANY 发明人 GRAUPERA ANTHONY;KELLOGG SEAN;UTLAUT MARK W.;PARKER N. WILLIAM
分类号 H01J27/00 主分类号 H01J27/00
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