发明名称 CHARGED PARTICLE BEAM DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a charged particle beam device in which the information based on the charged particles discharged from the bottom of a high aspect structure is made more obvious.SOLUTION: The charged particle beam device includes a first orthogonal electromagnetic field generator which deflects charged particles discharged from a sample, a second orthogonal electromagnetic field generator which further deflects the charged particles deflected by the first orthogonal electromagnetic field generator, an aperture formation member having a passage aperture of a charged particle beam, and a third orthogonal electromagnetic field generator for deflecting the charged particles passed through the aperture formation member.
申请公布号 JP2014010928(A) 申请公布日期 2014.01.20
申请号 JP20120144901 申请日期 2012.06.28
申请人 HITACHI HIGH-TECHNOLOGIES CORP 发明人 MAKINO HIROSHI;KAZUMI HIDEYUKI;YAMAZAKI MINORU;MIZUHARA YUZURU;IZAWA MIKI
分类号 H01J37/147;H01J37/05;H01J37/153;H01J37/244;H01J37/29 主分类号 H01J37/147
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