发明名称 |
CHARGED PARTICLE BEAM DEVICE |
摘要 |
PROBLEM TO BE SOLVED: To provide a charged particle beam device in which the information based on the charged particles discharged from the bottom of a high aspect structure is made more obvious.SOLUTION: The charged particle beam device includes a first orthogonal electromagnetic field generator which deflects charged particles discharged from a sample, a second orthogonal electromagnetic field generator which further deflects the charged particles deflected by the first orthogonal electromagnetic field generator, an aperture formation member having a passage aperture of a charged particle beam, and a third orthogonal electromagnetic field generator for deflecting the charged particles passed through the aperture formation member. |
申请公布号 |
JP2014010928(A) |
申请公布日期 |
2014.01.20 |
申请号 |
JP20120144901 |
申请日期 |
2012.06.28 |
申请人 |
HITACHI HIGH-TECHNOLOGIES CORP |
发明人 |
MAKINO HIROSHI;KAZUMI HIDEYUKI;YAMAZAKI MINORU;MIZUHARA YUZURU;IZAWA MIKI |
分类号 |
H01J37/147;H01J37/05;H01J37/153;H01J37/244;H01J37/29 |
主分类号 |
H01J37/147 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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