| 摘要 |
PROBLEM TO BE SOLVED: To provide a technology favorable to satisfy both of estimate accuracy of fluctuation in imaging characteristic of an exposure device and efficient determination of a standard for the estimate.SOLUTION: An exposure device for exposing a substrate comprises: a projection optical system for projecting light from a reticle to the substrate; a processing part for estimating fluctuation in imaging characteristic of the projection optical system on the basis of a preset standard; and an adjustment part for adjusting the imaging characteristic of the projection optical system on the basis of the fluctuation estimated by the processing part. When an error of the imaging characteristic of the projection optical system adjusted by the adjustment part on the basis of the fluctuation estimated on the basis of a first number of standards preset without using the reticle is not within the acceptable range, the processing part creates a second number of standards larger than the first number of standards for estimating the fluctuation, on the basis of the error. |
