发明名称 DEPOSITION APPARATUS
摘要 PROBLEM TO BE SOLVED: To manufacture a high-quality device by preventing dropping and adhesion of flake easily by a relatively simple configuration, and performing high-quality continuous deposition of less impurities by holding a high degree of vacuum in a vacuum vessel.SOLUTION: An MBE apparatus includes a vacuum vessel 10, a crucible 11a to be filled with a raw material 2, a heater 11b for heating the crucible 11a, and a shield mechanism 12 for preventing deposition of the raw material 2 around a deposited object 1 installed therein. In the shield mechanism 12, a plurality of shield plates 14 each having a notch 14b connecting doughnut shaped inner peripheral edge and outer peripheral edge are laminated while matching the position of the notch 14b, and a partition plate 16 is installed obliquely in the notch 14b so that a shield plate 14 to be used can be changed freely.
申请公布号 JP2014007245(A) 申请公布日期 2014.01.16
申请号 JP20120141106 申请日期 2012.06.22
申请人 FUJITSU LTD 发明人 SAITO TETSUO
分类号 H01L21/203;C23C14/00 主分类号 H01L21/203
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