ALUMINUM COMPOUND, RAW MATERIAL FOR THIN FILM FORMATION, AND METHOD OF PRODUCING THIN FILM

摘要

PROBLEM TO BE SOLVED: To provide: an aluminum compound with a low melting point, sufficient volatility and high thermal stability; a raw material for thin film formation containing the same; and a method of producing a thin film by using the raw material.SOLUTION: Provided are an aluminum compound represented by the specified general formula (I), a raw material for thin film formation containing the aluminum compound, and a method of producing a thin film. The method comprises: vaporizing the raw material for thin film formation to obtain vapor containing the aluminum compound; introducing the vapor into a deposition chamber in which a substrate is placed; and subjecting the aluminum compound to decomposition and/or chemical reaction to form a thin film containing aluminum on a surface of the substrate.