发明名称 METHOD FOR PERMANENTLY BONDING WAFERS
摘要 This invention relates to a method for bonding of a first contact surface of a first substrate to a second contact surface of a second substrate with the following steps, especially the following sequence: forming a reservoir in a surface layer on the first contact surface, the first surface layer consisting at least largely of a native oxide material, at least partial filling of the reservoir with a first educt or a first group of educts, the first contact surface making contact with the second contact surface for formation of a prebond connection, forming a permanent bond between the first and second contact surface, at least partially strengthened by the reaction of the first educt with a second educt contained in a reaction layer of the second substrate.
申请公布号 US2014017877(A1) 申请公布日期 2014.01.16
申请号 US201114007999 申请日期 2011.04.08
申请人 PLACH THOMAS;HINGERL KURT;WIMPLINGER MARKUS;FLOETGEN CHRISTOPH;EV GROUP E. THALLNER GMBH 发明人 PLACH THOMAS;HINGERL KURT;WIMPLINGER MARKUS;FLOETGEN CHRISTOPH
分类号 H01L21/18 主分类号 H01L21/18
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