| 摘要 |
<p>An assembly for use in a vacuum treatment process, the assembly including a process chamber 1. Gas analysis apparatus to sample and analyse the gas composition within the chamber 1 is provided. The gas analysis apparatus includes a measuring apparatus 14 based either on a miniature mass spectrometer or on a miniature plasma source, which is located within an elongate housing 18. Part of the housing 18 is located within the process chamber 1 such that the gas is analysed within the chamber 1. The process can be controlled in response to the gas analysis.</p> |
