发明名称 DIELECTRIC BARRIER DISCHARGE-TYPE ELECTRODE STRUCTURE FOR GENERATING PLASMA
摘要 <p>Provided is a dielectric barrier discharge-type electrode structure for generating plasma. The electrode structure, according to the present invention, comprises: upper and lower flexible electrodes; upper and lower dielectric layers, which are formed under the upper flexible electrode and/or above the lower flexible electrode, respectively; at least one protrusion, which is formed between the upper and lower dielectric layers or between one side of the upper and lower dielectric layers and one side of the upper and lower flexible electrodes, for maintaining a specific gap (d) between the layers that are formed; and a through-hole which is formed on at least one position on the upper and lower flexible electrodes and the dielectric layers, wherein the plasma is formed in the formed gap (d) by applying direct current or alternating current to the upper and lower flexible electrodes, and an active species fluid, which is generated by means of the plasma, is supplied to the fluid that is introduced to the inside of the through-hole, thereby purifying the fluid.</p>
申请公布号 WO2014010768(A1) 申请公布日期 2014.01.16
申请号 WO2012KR05561 申请日期 2012.07.13
申请人 SP TECH;SOHN, HEE SIK 发明人 SOHN, HEE SIK
分类号 H05H1/34;A61L9/22 主分类号 H05H1/34
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