发明名称 DEVELOPERS COMPOSITIONS FOR RADIATION SENSITIVE COMPOSITIONS
摘要 The present invention relates to: a developing liquid composition for a radiation sensitive composition which contains (a) a polyalcohol compound, (b) an alkali compound, (c) a surfactant, and (d) water; and a production method of a liquid display device using the same. The developing liquid composition for the radiation sensitive composition contains: 1-2 wt% of polyalcohol compound, 1-10 wt% of alkali compound, 5-20 wt% of surfactant, and the balance of water.
申请公布号 KR20140006660(A) 申请公布日期 2014.01.16
申请号 KR20120074140 申请日期 2012.07.06
申请人 DONGWOO FINE-CHEM CO., LTD. 发明人 LEE, YU JIN;KO, KYUNG JUN;LEE, EUN SANG
分类号 G03F7/00;G02F1/13;G03F7/32 主分类号 G03F7/00
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