发明名称 |
DEVELOPERS COMPOSITIONS FOR RADIATION SENSITIVE COMPOSITIONS |
摘要 |
The present invention relates to: a developing liquid composition for a radiation sensitive composition which contains (a) a polyalcohol compound, (b) an alkali compound, (c) a surfactant, and (d) water; and a production method of a liquid display device using the same. The developing liquid composition for the radiation sensitive composition contains: 1-2 wt% of polyalcohol compound, 1-10 wt% of alkali compound, 5-20 wt% of surfactant, and the balance of water. |
申请公布号 |
KR20140006660(A) |
申请公布日期 |
2014.01.16 |
申请号 |
KR20120074140 |
申请日期 |
2012.07.06 |
申请人 |
DONGWOO FINE-CHEM CO., LTD. |
发明人 |
LEE, YU JIN;KO, KYUNG JUN;LEE, EUN SANG |
分类号 |
G03F7/00;G02F1/13;G03F7/32 |
主分类号 |
G03F7/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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