发明名称 Semiconductor device and method for manufacturing semiconductor device
摘要 The semiconductor device includes a driver circuit including a first thin film transistor and a pixel including a second thin film transistor over one substrate. The first thin film transistor includes a first gate electrode layer, a gate insulating layer, a first oxide semiconductor layer, a first oxide conductive layer, a second oxide conductive layer, an oxide insulating layer which is in contact with part of the first oxide semiconductor layer and which is in contact with peripheries and side surfaces of the first and second oxide conductive layers, a first source electrode layer, and a first drain electrode layer. The second thin film transistor includes a second gate electrode layer, a second oxide semiconductor layer, and a second source electrode layer and a second drain electrode layer each formed using a light-transmitting material.
申请公布号 US8629441(B2) 申请公布日期 2014.01.14
申请号 US20100848389 申请日期 2010.08.02
申请人 YAMAZAKI SHUNPEI;SAKATA JUNICHIRO;HOSOBA MIYUKI;TAKAHASHI TATSUYA;SEMICONDUCTOR ENERGY LABORATORY CO., LTD. 发明人 YAMAZAKI SHUNPEI;SAKATA JUNICHIRO;HOSOBA MIYUKI;TAKAHASHI TATSUYA
分类号 H01L29/10 主分类号 H01L29/10
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