| 摘要 |
A composition (I) comprising color acceptor chosen from 4,4'-dihydroxydiphenylsulfone and sensitizer chosen from stearic acid amide, dimethylsulfone, 2-(2H-benzotriazol-2-yl)-p-cresol and dimethylterephthalate is prepared. A composition (II) comprising (meth)acrylate(s), photoinitiator and wax is prepared. The composition (I) is coated on the front side of the substrate to form thermosensitive recording layer and dried. The composition (II) is coated and crosslinked by irradiating high energy radiation to form thermosensitive recording material. A thermosensitive recording layer containing color former and color acceptor is provided on the front surface of a substrate. A protecting layer is provided on the reverse side to obtain thermosensitive recording material. A composition (I) comprising 80 wt.% or more of color acceptor chosen from 4,4'-dihydroxydiphenylsulfone and sensitizer chosen from stearic acid amide, dimethylsulfone, 2-(2H-benzotriazol-2-yl)-p-cresol and dimethylterephthalate is prepared. A composition (II) comprising 65-95 wt.% of (meth)acrylate(s), 0-20 wt.% of photoinitiator and 0.5-20 wt.% of wax is prepared. A composition (III) comprising 65-95 wt.% of (meth)acrylate(s) and 0-20 wt.% of photoinitiator is prepared. The composition (I) is coated on the front side of the substrate to form thermosensitive recording layer and dried. The composition (II) is coated and crosslinked by irradiating high energy radiation. The composition (III) is coated on the reverse surface of the substrate and crosslinked by irradiating high energy radiation to form thermosensitive recording material. |
