发明名称 SUBSTRATE CONVEYING EQUIPMENT OF LIQUID TREATMENT EQUIPMENT
摘要 PURPOSE: To cope with a substrate of different width size, without a working for changing the position of a conveying roller according to the width size of a substrate to be conveyed, by forming the roller part of the conveying roller, in a taper type whose outer side is made thick. CONSTITUTION: Both end portions of a substrate 2 is retained by the roller parts 1b of conveying rollers 1 on both rows, and the substrate 2 is conveyed in the carriage direction, by the rotation of each of the conveying rollers 1. The roller part 1b of each of the conveying rollers 1 on both rows is formed in a taper type wherein the outer side is thick and the inner side becomes thin gradually. By forming the roller part 1b in the taper type, each end surface of both end portions of the substrate 2 which is retained by the conveying rollers 1 and conveyed can be prevented from shifting in the width direction, in the part whose diameter is larger than the part in the roller part 1b with which the substrate end surface comes into contact. Thereby the wafer is stably conveyed.
申请公布号 JPH08321536(A) 申请公布日期 1996.12.03
申请号 JP19950126743 申请日期 1995.05.25
申请人 SHARP CORP 发明人 MINAMI YASUO
分类号 B65G49/07;B08B3/02;B65G13/00;B65G13/02;B65G39/10;B65G49/06;G02F1/13;H01L21/027;H01L21/304;H01L21/677;H01L21/68;(IPC1-7):H01L21/68 主分类号 B65G49/07
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