| 摘要 |
When supplying a gas phase raw material, which sublimates a precursor of a raw material, to a process chamber for performing film forming treatment on an object to be treated, a method prepared by the present invention efficiently sublimates the precursor inside a raw material container. Trays (41), which accommodate the precursor (50), in multiple layers are accumulated on top of each other inside a housing (24) having an opening (30) that communicates with the process chamber (2). Each tray (41) comprises: an inlet (a hole) (45) which introduces carrier gas into the tray (41); an outlet (a gap) (28) which communicates with the opening (30) as the carrier gas leaks along with the gas phase raw material of the precursor (50); and a cover (46) which can be opened and closed and holds the precursor (50) inside the tray (41). |
