COATING LIQUID FOR DOPANT DIFFUSION, METHOD FOR APPLYING SAME, METHOD FOR PRODUCING SEMICONDUCTOR USING SAME, AND SEMICONDUCTOR

摘要

This coating liquid for dopant diffusion contains, as a dopant source, an acid that is selected from among phosphoric acids and boric acids and an organic amine salt of an organic amine compound (alpha) having 1-4 nitrogen atoms. Consequently, there can be provided: a coating liquid for dopant diffusion, which is capable of providing a semiconductor having a high surface resistivity; a method for applying the coating liquid for dopant diffusion; a method for producing a semiconductor using the coating liquid for dopant diffusion; and a semiconductor.