发明名称 WAFER PROCESSING METHOD
摘要 PROBLEM TO BE SOLVED: To provide chips with adhesive films by cutting an adhesive film along the chips, without generating device failure due to clog in a cutting plate or thin burr, die shift, or areas not being fractured.SOLUTION: A wafer processing method comprises the steps for: dividing a wafer 1 into individual chips 15 (division step); adhering an ultraviolet transmitting tape 32 on a rear face 1b of the wafer 1 via an ultraviolet curable die-attach liquid agent 30 (adhesive step) after the division step; irradiating an adhesive film 31 made of the die-attach liquid agent 30 with ultraviolet light from the rear face 1b side of the wafer 1 through the tape 32 to semi-cure the adhesive film 31 after the adhesive step (ultraviolet rear face irradiation step); irradiating the adhesive film 31 with ultraviolet light from a front face 1a side of the wafer 1 to cure only part corresponding to predetermined division lines 11 of the adhesive film 31 (ultraviolet front face irradiation step); and picking up the chips 15 with adhesive films after the irradiation steps.
申请公布号 JP2014003156(A) 申请公布日期 2014.01.09
申请号 JP20120137425 申请日期 2012.06.19
申请人 DISCO ABRASIVE SYST LTD 发明人 KOBAYASHI YOSHIKAZU
分类号 H01L21/301 主分类号 H01L21/301
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