发明名称 ATOMIC ABSORPTION ANALYSIS METHOD AND ATOMIC ABSORPTION PHOTOMETER
摘要 PROBLEM TO BE SOLVED: To provide an atomic absorption photometer which dries a liquid measurement sample injected into a graphite tube at a pre-measurement stage, allows determination of whether or not the drying is appropriately performed, and achieves target measurement sensitivity and measurement reproducibility in the minimum number of measurements without repeating the measurement several times.SOLUTION: Absorbance of reference light which is a component perpendicular to a magnetic field of light passing through a heating part, is obtained. When the time in which the absorbance of the reference light exceeds a predetermined value is within a predetermined time, bumping of a sample is determined to be caused. Alternatively, bumping of the sample is determined to be caused when the absorbance of sample light which is a component parallel to a magnetic field of light passing through the heating part and the absorbance of the reference light which is a component perpendicular to a magnetic field of light passing through the heating part are obtained, and when corrected absorbance obtained by subtracting the reference light absorbance from the sample light absorbance exceeds a predetermined value.
申请公布号 JP2014002037(A) 申请公布日期 2014.01.09
申请号 JP20120137408 申请日期 2012.06.19
申请人 HITACHI HIGH-TECHNOLOGIES CORP 发明人 TOBE HAYATO;ISHIDA HIROYASU;SAKAMOTO HIDEYUKI
分类号 G01N21/31 主分类号 G01N21/31
代理机构 代理人
主权项
地址