| 摘要 |
PROBLEM TO BE SOLVED: To provide a novel positive type highly active composition particularly for manufacturing a relief structure by containing a mixture of a plurality of phenol resins in which phenolic hydroxyl group is partially substituted by specified acetal and/or ketal side groups in a specified ratio as resin component. SOLUTION: This composite contains 9.9-95wt.% of a phenol resin in which phenolic hydroxyl group is substituted by a protecting group of the formula I up to 10-90%, 4.9-90wt.% of a phenol resin in which phenolic hydroxyl group is substituted by protecting group of the formula II up to 10-90%, and 0.1-20.0wt.% of a material forming an acid under the influence of chemical acting radiation. In the formulae, R1 , R2 each independently represent C1-C6 alkyl, or C3-C6 cycloalkyl non-substituted or substituted by C1-C4 alkyl, and R3 represents C1-C6 alkyl. X represents C1-C4 alkoxy non-substituted or substituted by C1-C4 alkyl. |
