| 摘要 |
PROBLEM TO BE SOLVED: To provide a composition for photocurable nanoimprint having excellent etching resistance of chlorine gas, facilitating transfer of a pattern, and ensuring excellent adhesion of the pattern to a substrate, excellent releasability from a die, good dispersibility, and excellent productivity.SOLUTION: The composition for photocurable nanoimprint contains (A) a hydrolysis mixture containing a hydrolysate of fluorination organic silane compound, a hydrolysate of an organic silicon compound having a (meth)acryl group, and a hydrolysate of a specific metal alkoxide, (B) a polymerizable monomer having a (meth)acryl group, and (C) a photopolymerization initiator. A hydrolysate of an organic silicon compound may be added to the hydrolysis mixture of (A). |
