发明名称 Semiconductor devices including 3-D structures with support pad structures and related methods and systems
摘要 A semiconductor device may include a semiconductor substrate and a plurality of three-dimensional capacitors on the semiconductor substrate. Each of the plurality of three-dimensional capacitors may include a first three-dimensional electrode, a capacitor dielectric layer, and a second three-dimensional electrode with the first three-dimensional electrode between the capacitor dielectric layer and the semiconductor substrate and with the capacitor dielectric layer between the first and second three-dimensional electrodes. A plurality of capacitor support pads may be provided with each capacitor support pad being arranged between adjacent first three-dimensional electrodes of adjacent three-dimensional capacitors with portions of the capacitor dielectric layers between the capacitor support pads and the semiconductor substrate. Related methods and apparatuses are also discussed.
申请公布号 US8624354(B2) 申请公布日期 2014.01.07
申请号 US20100829864 申请日期 2010.07.02
申请人 KIM SHIN-HYE;BYUN KYUNG-MUN;KIM HONG-RAE;CHOI GIL-HEYUN;HONG EUN-KEE;SAMSUNG ELECTRONICS CO., LTD. 发明人 KIM SHIN-HYE;BYUN KYUNG-MUN;KIM HONG-RAE;CHOI GIL-HEYUN;HONG EUN-KEE
分类号 H01L21/02 主分类号 H01L21/02
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