| 摘要 |
A coating treatment device, a substrate treatment system, a method for treating a coating, and a computer storage medium are provided to prevent reduction of the thickness of a coating layer by preventing sublimation of a coating liquid. A coating treatment device(24) comprises a treatment container(150), a coating nozzle(130), and an irradiation unit. The treatment container, has a transfer-in/out port for transferring-in/out a substrate and a rotatable spin chuck(120) supporting the substrate, wherein the substrate is contained. The coating nozzle applies a coating liquid on a pattern of the substrate. The irradiation unit radiates ultraviolet rays to the coating liquid applied on the pattern of the substrate. |
