发明名称 Non-volatile memory structure and method for fabricating the same
摘要 The disclosure provides a non-volatile memory structure and a method for fabricating the same. The non-volatile memory structure includes a first contact connected to a first transistor. A second contact is connected to a second transistor. A resistance-changing memory material pattern covers and contacts the second contact but not the first contact. A top electrode contacts both the resistance-changing memory material pattern and the first contact. An area of the resistance-changing memory material pattern is substantially larger than an area of its interface with the second contact.
申请公布号 US8624218(B2) 申请公布日期 2014.01.07
申请号 US201213342171 申请日期 2012.01.02
申请人 CHEN FREDERICK T;INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE 发明人 CHEN FREDERICK T
分类号 H01L47/00;G11C11/00;H01L21/20 主分类号 H01L47/00
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