发明名称 |
Lithographic apparatus configured to suppress contamination from passing into the projection system and method |
摘要 |
A lithographic apparatus includes a projection system configured to project a patterned beam of radiation onto a substrate. The projection system being provided with an opening through which the patterned beam of radiation may pass. At least part of the opening comprises a sloped surface of a wall of the projection system and a sloped surface of a mirror of the projection system. |
申请公布号 |
US8625068(B2) |
申请公布日期 |
2014.01.07 |
申请号 |
US20100975898 |
申请日期 |
2010.12.22 |
申请人 |
NIENHUYS HAN-KWANG;JONKERS PETER GERARDUS;HUIJBERTS ALEXANDER MARINUS ARNOLDUS;ASML NETHERLANDS B.V. |
发明人 |
NIENHUYS HAN-KWANG;JONKERS PETER GERARDUS;HUIJBERTS ALEXANDER MARINUS ARNOLDUS |
分类号 |
G03B27/52 |
主分类号 |
G03B27/52 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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