| 摘要 |
A coating method, a coating apparatus, and a memory medium are provided to improve a film thickness control and coating quality by sucking back a treatment liquid on a substrate through a nozzle located at an injection termination position. A substrate supporter(76) supports a substrate(G) to be processed, horizontally. A long-shaped nozzle(78) injects a treatment liquid onto an upper surface of the substrate with a minute gap spaced away therefrom. A treatment liquid source supplies the treatment liquid to the nozzle. An injection unit moves the nozzle in a horizontal direction with respect to the substrate. An elevation unit elevates the nozzle in vertical direction with respect to the substrate. A controller controls the injection unit to position the nozzle at a preset injection termination position. The controller controls the nozzle positioned at the preset injection termination position to suck-back the treatment liquid residing on the substrate with a preset amount. |
