发明名称 Pattern structures in semiconductor devices
摘要 A pattern structure in a semiconductor device includes an extending line and a pad connected with an end portion of the extending line. The pad may have a width that is larger than a width of the extending line. The pad includes a protruding portion extending from a lateral portion of the pad. The pattern structure may be formed by simplified processes and may be employed in various semiconductor devices requiring minute patterns and pads.
申请公布号 US8618679(B2) 申请公布日期 2013.12.31
申请号 US20100862972 申请日期 2010.08.25
申请人 SIM JAEHWANG;MIN JAEHO;LEE JAEHAN;KIM KEONSOO;SAMSUNG ELECTRONICS CO., LTD. 发明人 SIM JAEHWANG;MIN JAEHO;LEE JAEHAN;KIM KEONSOO
分类号 H01L23/485 主分类号 H01L23/485
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