发明名称 |
Pattern structures in semiconductor devices |
摘要 |
A pattern structure in a semiconductor device includes an extending line and a pad connected with an end portion of the extending line. The pad may have a width that is larger than a width of the extending line. The pad includes a protruding portion extending from a lateral portion of the pad. The pattern structure may be formed by simplified processes and may be employed in various semiconductor devices requiring minute patterns and pads. |
申请公布号 |
US8618679(B2) |
申请公布日期 |
2013.12.31 |
申请号 |
US20100862972 |
申请日期 |
2010.08.25 |
申请人 |
SIM JAEHWANG;MIN JAEHO;LEE JAEHAN;KIM KEONSOO;SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
SIM JAEHWANG;MIN JAEHO;LEE JAEHAN;KIM KEONSOO |
分类号 |
H01L23/485 |
主分类号 |
H01L23/485 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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