发明名称 Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method
摘要 <p>Building of a model profile for a target is disclosed. An embodiment of the method includes importing an image of a known object and superimposing, on this image, either by hand or automatically, an estimated profile. The estimated profile is defined mathematically and adjusted segment by segment in order to match the image such that the adjusted estimated profile may be stored alongside a diffraction spectrum associated with the image. Alternatively or additionally, a user may trace (or free-draw) the profile of a known image and subsequently map a shape-definer of a mathematical function such as a polynomial equation, a spline or a vector onto the estimated profile in order to obtain a profile and one or more variables of that profile that may be used to reconstruct the profile of an unknown object from its diffraction pattern.</p>
申请公布号 IL188768(A) 申请公布日期 2013.12.31
申请号 IL20080188768 申请日期 2008.01.14
申请人 ASML NETHERLANDS B.V. 发明人
分类号 B82B 主分类号 B82B
代理机构 代理人
主权项
地址