| 发明名称 |
DEPOSITION CHAMBER AND METHOD OF USING THE SAME |
| 摘要 |
<p>Abstract of DisclosureDEPOSITION CHAMBER AND METHOD OF USING THE SAMEThe present invention provides a deposition chamber and a method of using the same. The deposition chamber includes a heater base and at least a sensor. The heater base includes a heater plate and a heater lifter, wherein the heater lifter supports the heater plate, and the heater plate and a part of the heater lifter are enclosed in a chamber body. The sensor is disposed on the heater lifter to monitor the leveling of the heater. Figure 1</p> |
| 申请公布号 |
SG195401(A1) |
申请公布日期 |
2013.12.30 |
| 申请号 |
SG20120035101 |
申请日期 |
2012.05.14 |
| 申请人 |
UNITED MICROELECTRONICS CORP. |
发明人 |
LIU, FENG;LIM, BOON CHUNG ALVIN;LI, FENG;ANG, LAY-HUAT |
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