发明名称 IMPROVED SYSTEM FOR SUBSTRATE PROCESSING
摘要 A method of processing IC units comprising the steps of: dicing said IC units from a substrate; delivering said IC units to a idle block; inspecting a face of said units as exposed during the dicing step using an inspection device whilst said units are on said idle block, then; engaging said units with a picker assembly; passing said units over a second inspection device to inspect an opposed face of said units.
申请公布号 US2013344629(A1) 申请公布日期 2013.12.26
申请号 US201214002861 申请日期 2012.03.02
申请人 BAEK SEUNG HO;JUNG JONG JAE;KIM TAE JIN;ROKKO SYSTEMS PTE LTD 发明人 BAEK SEUNG HO;JUNG JONG JAE;KIM TAE JIN
分类号 H01L21/67;H01L21/677 主分类号 H01L21/67
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