发明名称 |
ORGANIC SOLVENT DEVELOPABLE PHOTORESIST COMPOSITION |
摘要 |
Provided is a hydrophobic negative tone developable (NTD) resist composition comprising (a) a hydrophobic polymer having (i) at least one nonpolar acid-stable group; and (ii) at least one nonpolar acid-labile group, and (b) a photoacid generator (PAG) that may or may not be bound to the polymer, wherein a nonpolar aromatic or aliphatic organic hydrocarbon solvent is used to develop the unexposed regions of the NTD resist film and the resist film is not developable in an aqueous base developer, such as 0.26 N TMAH. |
申请公布号 |
US2013344441(A1) |
申请公布日期 |
2013.12.26 |
申请号 |
US201213530004 |
申请日期 |
2012.06.21 |
申请人 |
SOORIYAKUMARAN RATNAM;SUNDBERG LINDA K.;VORA ANKIT;INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
SOORIYAKUMARAN RATNAM;SUNDBERG LINDA K.;VORA ANKIT |
分类号 |
G03F7/004;C08F228/04;G03F7/20 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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