发明名称 METHOD FOR MANUFACTURING COLOR FILTER SUBSTRATE
摘要 PROBLEM TO BE SOLVED: To provide a method for manufacturing a color filter substrate capable of enhancing color reproducibility.SOLUTION: There is provided a method for manufacturing a color filter substrate provided on one of a pair of substrates for holding a liquid crystal layer, the method comprising the steps of: forming a tungsten silicide film and a resist film on a second substrate 20a; forming a resist pattern 42; forming a light shielding film 41 by applying etching treatment to the tungsten silicide film using the resist pattern 42 as a mask; and forming a recess 35 filled with a color filter material by applying etching treatment to the second substrate 20a using the resist pattern 42 and the light shielding film 41 as a mask.
申请公布号 JP2013257442(A) 申请公布日期 2013.12.26
申请号 JP20120133523 申请日期 2012.06.13
申请人 SEIKO EPSON CORP 发明人 ONO TAKEHIRO;MOCHIZUKI HIROAKI;KUBOTA NAOTAKA;YAMAJI SHOHEI
分类号 G02B5/20;G02F1/1335 主分类号 G02B5/20
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