发明名称 |
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN |
摘要 |
A resist composition which generates a base upon exposure and exhibits increased solubility in an alkali developing solution under the action of acid, and the resist composition including: a base component (A) that exhibits increased solubility in an alkali developing solution under the action of acid; an acidic compound component (G1) including a nitrogen-containing cation having a pKa value of 7 or less and a counteranion; and a buffer component (K) including a nitrogen-containing cation and a counteranion being a conjugate base for the acid having a pKa value of 0 to 5. |
申请公布号 |
US2013344436(A1) |
申请公布日期 |
2013.12.26 |
申请号 |
US201313922758 |
申请日期 |
2013.06.20 |
申请人 |
TOKYO OHKA KOGYO CO., LTD. |
发明人 |
NAKAMURA TSUYOSHI;YOKOYA JIRO;NITO HIDETO;SHIMIZU HIROAKI |
分类号 |
G03F7/004 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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