PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION USED FOR THE METHOD, RESIST FILM, METHOD FOR MANUFACTURING ELECTRONIC DEVICE USING THE SAME, AND ELECTRONIC DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a pattern forming method exhibiting excellence in local critical dimension uniformity (local CDU, nm) and exposure latitude (EL) and remarkably reducing generation of scum in a process of forming a fine pattern such as a hole pattern having a hole diameter of 45 nm or less by use of an organic developing solution, and to provide an actinic ray-sensitive or radiation-sensitive resin composition used for the method, a resist film, a method for manufacturing an electronic device using the above pattern forming method, and an electronic device.SOLUTION: A pattern forming method includes steps of: (1) forming a film of an actinic ray-sensitive or radiation-sensitive resin composition containing the following components (A) to (C); (2) exposing the film; and (3) forming a negative pattern by developing the exposed film by use of a developing solution containing an organic solvent. The resin composition contains: (A) a resin showing an increase in the polarity by an action of an acid to decrease the solubility with a developing solution containing an organic solvent; (B) a compound generating an acid by irradiation with actinic rays or radiation; and (C) a salt that has a conjugate base structure having a pKa of -2 or higher in the molecule and is substantially not decomposed by actinic rays or radiation.