| 发明名称 |
CYCLIC COMPOUND, MANUFACTURING METHOD THEREFOR, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMING A RESIST PATTERN |
| 摘要 |
A cyclic compound represented by formula (1):
wherein L, R 1 , R', and m are as defined in the specification. The cyclic compound of formula (1) is highly soluble to a safety solvent, highly sensitive, and capable of forming resist patterns with good profile. Therefore, the cyclic compound is useful as a component of a radiation-sensitive composition. |
| 申请公布号 |
EP2474565(A4) |
申请公布日期 |
2013.12.25 |
| 申请号 |
EP20100812016 |
申请日期 |
2010.08.27 |
| 申请人 |
MITSUBISHI GAS CHEMICAL COMPANY, INC. |
发明人 |
ECHIGO, MASATOSHI;HAYASHI, HIROMI |
| 分类号 |
C08G8/32;C07C69/21;G03F7/004;G03F7/038;H01L21/027 |
主分类号 |
C08G8/32 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
