发明名称 Nitride-based semiconductor device and method for manufacturing the same
摘要 Disclosed herein are a nitride-based semiconductor device and a method for manufacturing the same. The nitride-based semiconductor device includes: a base substrate having a front surface and a rear surface opposite to the front surface; an epitaxial growth film formed on the front surface of the base substrate; a semiconductor layer formed on the rear surface of the base substrate; and an electrode structure body provided on the epitaxial growth film.
申请公布号 US8614464(B2) 申请公布日期 2013.12.24
申请号 US201113049444 申请日期 2011.03.16
申请人 JEON WOOCHUL;PARK KIYEOL;PARK YOUNGHWAN;SAMSUNG ELECTRO-MECHANICS CO., LTD. 发明人 JEON WOOCHUL;PARK KIYEOL;PARK YOUNGHWAN
分类号 H01L27/148;H01L21/02;H01L29/66 主分类号 H01L27/148
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