发明名称 |
Fluid handling structure, lithographic apparatus and device manufacturing method, involving gas supply |
摘要 |
A fluid handling structure is provided for a lithographic apparatus having at a boundary between a space containing immersion fluid and a region external to the fluid handling structure, a plurality of openings arranged in a first line, a first gas knife device having an aperture in a second line, one or more openings in a third line and a second gas knife device having an aperture in a fourth line. |
申请公布号 |
US8614784(B2) |
申请公布日期 |
2013.12.24 |
申请号 |
US20100886956 |
申请日期 |
2010.09.21 |
申请人 |
RIEPEN MICHEL;KEMPER NICOLAAS RUDOLF;MULKENS JOHANNES CATHARINUS HUBERTUS;CORTIE ROGIER HENDRIKUS MAGDALENA;MEIJERS RALPH JOSEPH;EVANGELISTA FABRIZIO;ASML NETHERLANDS B.V. |
发明人 |
RIEPEN MICHEL;KEMPER NICOLAAS RUDOLF;MULKENS JOHANNES CATHARINUS HUBERTUS;CORTIE ROGIER HENDRIKUS MAGDALENA;MEIJERS RALPH JOSEPH;EVANGELISTA FABRIZIO |
分类号 |
G03B27/52;G03B27/32 |
主分类号 |
G03B27/52 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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